000 04303nam a22005295i 4500
001 978-3-211-99311-8
003 DE-He213
005 20140220082837.0
007 cr nn 008mamaa
008 140124s2013 au | s |||| 0|eng d
020 _a9783211993118
_9978-3-211-99311-8
024 7 _a10.1007/978-3-211-99311-8
_2doi
050 4 _aTA418.7-418.76
050 4 _aTA418.9.T45
072 7 _aTGM
_2bicssc
072 7 _aPNRX
_2bicssc
072 7 _aTEC021000
_2bisacsh
082 0 4 _a620.44
_223
100 1 _aSchneller, Theodor.
_eeditor.
245 1 0 _aChemical Solution Deposition of Functional Oxide Thin Films
_h[electronic resource] /
_cedited by Theodor Schneller, Rainer Waser, Marija Kosec, David Payne.
264 1 _aVienna :
_bSpringer Vienna :
_bImprint: Springer,
_c2013.
300 _aXVII, 796 p. 390 illus., 133 illus. in color.
_bonline resource.
336 _atext
_btxt
_2rdacontent
337 _acomputer
_bc
_2rdamedia
338 _aonline resource
_bcr
_2rdacarrier
347 _atext file
_bPDF
_2rda
505 0 _aIntroduction -- Solution Chemistry; Simple alskoxide based precursor systems; Carboxylate based precursor systems; Single-source precursors; Acqueos Precursor Systems; Solution Synthesis Strategies -- Analytical Methods; Introduction; Thermal Analysis; NMR Sepctroscopy; EXAFS; Other Methods (XRM, SEM,TEM;scattering methods at nanocrystalline films); Spin-Coating; Dip Coating; Inkjet Printing and Other Direct Writing Methods(dip point and imprint techniques); Chemical Bath Deposition; Polymer Assisted Deposition -- Processing and Crystallization; Thermodynamics and Heating Processes; Material Systems Dominated by Heterogeneous Nucleation; Material Systems Dominated by Homogeneous Nucleation; Low Temperature Processing; Epitaxial Films; Powder Assisted Film Fabrication; UV-and E-Beam Direct Patterning of Photosensitive CSD Films; Template Controlled Growth -- Functions and Applications; Introduction; Integrated Capacitors; Base Metal Electrodes; Polar Oxide Films for MEMS Applications;Conducting Films and Electrodes; Transparent conducting oxides; Superconducting Films; Porous Films for Gas Sensors; Luminescent Fims -- Appendix; Synthesis for Standard material Systems.
520 _aThis is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered
650 0 _aChemistry, Physical organic.
650 0 _aIndustrial engineering.
650 0 _aChemistry, inorganic.
650 0 _aSurfaces (Physics).
650 1 4 _aMaterials Science.
650 2 4 _aSurfaces and Interfaces, Thin Films.
650 2 4 _aPhysical Chemistry.
650 2 4 _aIndustrial and Production Engineering.
650 2 4 _aTribology, Corrosion and Coatings.
700 1 _aWaser, Rainer.
_eeditor.
700 1 _aKosec, Marija.
_eeditor.
700 1 _aPayne, David.
_eeditor.
710 2 _aSpringerLink (Online service)
773 0 _tSpringer eBooks
776 0 8 _iPrinted edition:
_z9783211993101
856 4 0 _uhttp://dx.doi.org/10.1007/978-3-211-99311-8
912 _aZDB-2-CMS
999 _c96331
_d96331