000			01516nam a22004455i 4500
001			978-3-540-76664-3
003			DE-He213
005			20130515021718.0
007			cr nn 008mamaa
008			100301s2008 gw | s |||| 0|eng d
020			_a9783540766643 _9978-3-540-76664-3
024	7		_a10.1007/978-3-540-76664-3 _2doi
050		4	_aTA418.7-418.76
050		4	_aTA418.9.T45
072		7	_aTGM _2bicssc
072		7	_aTEC021000 _2bisacsh
082	0	4	_a620.44 _223
100	1		_aDepla, Diederik.
245	1	0	_aReactive Sputter Deposition _h[electronic resource] / _cedited by Diederik Depla, Stijn Mahieu.
260			_aBerlin, Heidelberg : _bSpringer Berlin Heidelberg, _c2008.
300			_bdigital.
490	0		_aSpringer Series in Materials Science, _x0933-033X ; _v109
650		0	_aChemistry.
650		0	_aChemistry, Physical organic.
650		0	_aChemical engineering.
650		0	_aSurfaces (Physics).
650	1	4	_aChemistry.
650	2	4	_aSurfaces and Interfaces, Thin Films.
650	2	4	_aCondensed Matter Physics.
650	2	4	_aPhysical Chemistry.
650	2	4	_aIndustrial Chemistry/Chemical Engineering.
700	1		_aMahieu, Stijn.
710	2		_aSpringerLink (Online service)
773	0		_tSpringer eBooks
776	0	8	_iPrinted edition: _z9783540766629
830		0	_aSpringer Series in Materials Science, _x0933-033X ; _v109
856	4	0	_uhttp://dx.doi.org/10.1007/978-3-540-76664-3
912			_aZDB-2-CMS
999			_c80028 _d80028