000 01340cam a2200301 a 4500
999 _c115588
_d115588
001 4994081
003 KEPU
005 20190705124128.0
008 990216s1999 nyua 001 0 eng
010 _a 99014252
020 _a0471534781 (alk. paper)
040 _aDLC
_cDLC
_dDLC
050 0 0 _aTP155.7
_b.F44 1999
082 0 0 _221
100 1 _aFelder, Richard M.,
_d1939-
_935149
245 1 0 _aElementary principles of chemical processes /
_cRichard M. Felder, Ronald W. Rousseau.
250 _a3rd ed.
260 _aNew York :
_bJohn Wiley,
_c1999.
300 _axxvi, 675 p. :
_bill. ;
_c26 cm. +
_e1 computer laser optical disc (4 3/4 in.)
504 _aIncludes index.
650 0 _aChemical processes.
_99022
700 1 _aRousseau, Ronald W.,
_d1943-
_935150
856 4 2 _3Contributor biographical information
_uhttp://www.loc.gov/catdir/bios/wiley041/99014252.html
856 4 2 _3Publisher description
_uhttp://www.loc.gov/catdir/description/wiley032/99014252.html
856 4 _3Table of Contents
_uhttp://www.loc.gov/catdir/toc/onix03/99014252.html
906 _a7
_bcbc
_corignew
_d1
_eocip
_f19
_gy-gencatlg
942 _2lcc
_cBK
_hTP155.7
_i.F44 1999