Chemical Vapour Deposition (Record no. 110920)

000 -LEADER
fixed length control field 03857nam a22004815i 4500
001 - CONTROL NUMBER
control field 978-1-84882-894-0
003 - CONTROL NUMBER IDENTIFIER
control field DE-He213
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20140220084514.0
007 - PHYSICAL DESCRIPTION FIXED FIELD--GENERAL INFORMATION
fixed length control field cr nn 008mamaa
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 100322s2010 xxk| s |||| 0|eng d
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9781848828940
-- 978-1-84882-894-0
024 7# - OTHER STANDARD IDENTIFIER
Standard number or code 10.1007/978-1-84882-894-0
Source of number or code doi
050 #4 - LIBRARY OF CONGRESS CALL NUMBER
Classification number T55.4-60.8
072 #7 - SUBJECT CATEGORY CODE
Subject category code TGXW
Source bicssc
072 #7 - SUBJECT CATEGORY CODE
Subject category code TEC040000
Source bisacsh
072 #7 - SUBJECT CATEGORY CODE
Subject category code TEC020000
Source bisacsh
082 04 - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 670
Edition number 23
100 1# - MAIN ENTRY--PERSONAL NAME
Personal name Xu, Yongdong.
Relator term author.
245 10 - TITLE STATEMENT
Title Chemical Vapour Deposition
Medium [electronic resource] :
Remainder of title An Integrated Engineering Design for Advanced Materials /
Statement of responsibility, etc by Yongdong Xu, Xiu-Tian Yan.
264 #1 -
-- London :
-- Springer London,
-- 2010.
300 ## - PHYSICAL DESCRIPTION
Other physical details online resource.
336 ## -
-- text
-- txt
-- rdacontent
337 ## -
-- computer
-- c
-- rdamedia
338 ## -
-- online resource
-- cr
-- rdacarrier
347 ## -
-- text file
-- PDF
-- rda
490 1# - SERIES STATEMENT
Series statement Engineering Materials and Processes,
International Standard Serial Number 1619-0181
505 0# - FORMATTED CONTENTS NOTE
Formatted contents note to Chemical Vapour Deposition -- Physical Fundamentals of Chemical Vapour Deposition -- Chemical Vapour Deposition Systems Design -- Thermodynamics and Kinetics of Chemical Vapour Deposition -- Chemical Vapour Infiltration -- Microstructure Evolution and Process Control.
520 ## - SUMMARY, ETC.
Summary, etc The rapid advancement in chemical vapour deposition (CVD) technology has reached many fields of application, including thin film coating, microelectronics and communications. Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials focuses on the application of this technology to engineering coatings and, in particular, to the manufacture of high performance materials, such as fibre reinforced ceramic composite materials, for structural applications at high temperatures. While previous discourses on CVD have had a tendency to focus solely on electronics, this book aims to provide a thorough exploration of the design and applications of advanced materials, and their manufacture in engineering. It addresses a wide range of topics related to CVD theories and applications. From physical fundamentals and principles, to optimisation of processing parameters and other current practices, this book is designed to guide readers through the development of both high performance materials and the design of CVD systems to manufacture such materials. Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials introduces integrated design and manufacture of advanced materials to researchers, industrial practitioners, postgraduates and senior undergraduate students. It also features a large body of appendices to provide references for further study. The Engineering Materials and Processes series focuses on all forms of materials and the processes used to synthesise and formulate them as they relate to the various engineering disciplines. The series deals with a diverse range of materials: ceramics; metals (ferrous and non-ferrous); semiconductors; composites, polymers, biomimetics etc. Each monograph in the series is written by a specialist and demonstrates how enhancements in materials and the processes associated with them can improve performance in the field of engineering in which they are used.
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Engineering.
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Structural control (Engineering).
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Materials.
650 14 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Engineering.
650 24 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Operating Procedures, Materials Treatment.
650 24 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Materials Science, general.
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Yan, Xiu-Tian.
Relator term author.
710 2# - ADDED ENTRY--CORPORATE NAME
Corporate name or jurisdiction name as entry element SpringerLink (Online service)
773 0# - HOST ITEM ENTRY
Title Springer eBooks
776 08 - ADDITIONAL PHYSICAL FORM ENTRY
Display text Printed edition:
International Standard Book Number 9781848828933
830 #0 - SERIES ADDED ENTRY--UNIFORM TITLE
Uniform title Engineering Materials and Processes,
-- 1619-0181
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier http://dx.doi.org/10.1007/978-1-84882-894-0
912 ## -
-- ZDB-2-CMS

No items available.

2017 | The Technical University of Kenya Library | +254(020) 2219929, 3341639, 3343672 | library@tukenya.ac.ke | Haile Selassie Avenue