Fundamentals of III-V Semiconductor MOSFETs (Record no. 110422)

000 -LEADER
fixed length control field 03935nam a22004695i 4500
001 - CONTROL NUMBER
control field 978-1-4419-1547-4
003 - CONTROL NUMBER IDENTIFIER
control field DE-He213
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20140220084506.0
007 - PHYSICAL DESCRIPTION FIXED FIELD--GENERAL INFORMATION
fixed length control field cr nn 008mamaa
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 100316s2010 xxu| s |||| 0|eng d
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9781441915474
-- 978-1-4419-1547-4
024 7# - OTHER STANDARD IDENTIFIER
Standard number or code 10.1007/978-1-4419-1547-4
Source of number or code doi
050 #4 - LIBRARY OF CONGRESS CALL NUMBER
Classification number TK7888.4
072 #7 - SUBJECT CATEGORY CODE
Subject category code TJFC
Source bicssc
072 #7 - SUBJECT CATEGORY CODE
Subject category code TEC008010
Source bisacsh
082 04 - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 621.3815
Edition number 23
100 1# - MAIN ENTRY--PERSONAL NAME
Personal name Oktyabrsky, Serge.
Relator term editor.
245 10 - TITLE STATEMENT
Title Fundamentals of III-V Semiconductor MOSFETs
Medium [electronic resource] /
Statement of responsibility, etc edited by Serge Oktyabrsky, Peide Ye.
264 #1 -
-- Boston, MA :
-- Springer US :
-- Imprint: Springer,
-- 2010.
300 ## - PHYSICAL DESCRIPTION
Extent XVI, 480p. 200 illus., 100 illus. in color.
Other physical details online resource.
336 ## -
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-- txt
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-- computer
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-- rdamedia
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-- online resource
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347 ## -
-- text file
-- PDF
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505 0# - FORMATTED CONTENTS NOTE
Formatted contents note Non-Silicon MOSFET Technology: A Long Time Coming -- Properties and Trade-Offs of Compound Semiconductor MOSFETs -- Device Physics and Performance Potential of III-V Field-Effect Transistors -- Theory of HfO2-Based High-k Dielectric Gate Stacks -- Density Functional Theory Simulations of High-k Oxides on III-V Semiconductors -- Interfacial Chemistry of Oxides on III-V Compound Semiconductors -- Atomic-Layer Deposited High-k/III-V Metal-Oxide-Semiconductor Devices and Correlated Empirical Model -- Materials and Technologies for III-V MOSFETs -- InGaAs, Ge, and GaN Metal-Oxide-Semiconductor Devices with High-k Dielectrics for Science and Technology Beyond Si CMOS -- Sub-100 nm Gate III-V MOSFET for Digital Applications -- Electrical and Material Characteristics of Hafnium Oxide with Silicon Interface Passivation on III-V Substrate for Future Scaled CMOS Technology -- p-type Channel Field-Effect Transistors -- Insulated Gate Nitride-Based Field Effect Transistors -- Technology/Circuit Co-Design for III-V FETs.
520 ## - SUMMARY, ETC.
Summary, etc Fundamentals of III-V Semiconductor MOSFETs presents the fundamentals and current status of research of compound semiconductor metal-oxide-semiconductor field-effect transistors (MOSFETs) that are envisioned as a future replacement of silicon in digital circuits. The material covered begins with a review of specific properties of III-V semiconductors and available technologies making them attractive to MOSFET technology, such as band-engineered heterostructures, effect of strain, nanoscale control during epitaxial growth. Due to the lack of thermodynamically stable native oxides on III-V's (such as SiO2 on Si), high-k oxides are the natural choice of dielectrics for III-V MOSFETs. The key challenge of the III-V MOSFET technology is a high-quality, thermodynamically stable gate dielectric that passivates the interface states, similar to SiO2 on Si. Several chapters give a detailed description of materials science and electronic behavior of various dielectrics and related interfaces, as well as physics of fabricated devices and MOSFET fabrication technologies. Topics also include recent progress and understanding of various materials systems; specific issues for electrical measurement of gate stacks and FETs with low and wide bandgap channels and high interface trap density; possible paths of integration of different semiconductor materials on Si platform.
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Engineering.
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Systems engineering.
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Optical materials.
650 14 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Engineering.
650 24 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Circuits and Systems.
650 24 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Solid State Physics.
650 24 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Spectroscopy and Microscopy.
650 24 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Optical and Electronic Materials.
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Ye, Peide.
Relator term editor.
710 2# - ADDED ENTRY--CORPORATE NAME
Corporate name or jurisdiction name as entry element SpringerLink (Online service)
773 0# - HOST ITEM ENTRY
Title Springer eBooks
776 08 - ADDITIONAL PHYSICAL FORM ENTRY
Display text Printed edition:
International Standard Book Number 9781441915467
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier http://dx.doi.org/10.1007/978-1-4419-1547-4
912 ## -
-- ZDB-2-ENG

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