Shacham-Diamand, Yosi.
Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications [electronic resource] / edited by Yosi Shacham-Diamand, Tetsuya Osaka, Madhav Datta, Takayuki Ohba. - New York, NY : Springer New York, 2009. - digital.
9780387958682
10.1007/978-0-387-95868-2 doi
Chemistry.
Chemical engineering.
Computer engineering.
Materials.
Nanotechnology.
Chemistry.
Electrochemistry.
Materials Science, general.
Industrial Chemistry/Chemical Engineering.
Electrical Engineering.
Nanotechnology.
QD551-578
541.37
Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications [electronic resource] / edited by Yosi Shacham-Diamand, Tetsuya Osaka, Madhav Datta, Takayuki Ohba. - New York, NY : Springer New York, 2009. - digital.
9780387958682
10.1007/978-0-387-95868-2 doi
Chemistry.
Chemical engineering.
Computer engineering.
Materials.
Nanotechnology.
Chemistry.
Electrochemistry.
Materials Science, general.
Industrial Chemistry/Chemical Engineering.
Electrical Engineering.
Nanotechnology.
QD551-578
541.37